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Cathay Advanced Materials Limited
 
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Cathay Advanced Materials Limited
[China]
Address:
B6208, Jinbao Chuangye Jiayuan, Zhongkai High Technology Development Zone, Huizhou Guangdong 516006 China
Phone:
86-75-22627166
Contact name:
Tao Zhen
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Cathay Advanced Materials Limited




Established in 1997, Cathay Advanced Materials Limited is recognized for its unique capabilities in the fabrication and supply of high purity Rare Earth metal & chemicals, sputtering target and evaporation materials for customers at industries, materials dealers, university and research institutes on cost-effective basis.

Lanthanum, Cerium, Praseodymium, Neodymium, Samarium, Europium, Gadolinium, Terbium, Dysprosium, Holmium, Erbium,Thulium, Ytterbium, Lutetium, Scandium, Yttrium, Cerium Mischmetal and Cerium Ammonium Nitrate. In individual metal, alloy, oxide, chloride, hydrate, sulphate, sulfide, acetate, oxalate, carbonate, fluoride, nitrate, nitride and iodide.

Purity: 98%, 99%, 99.5%, 99.9%, 99.95%, 99.99%, 99.999% and 99.9999%.

Shape: foil, sheet, piece, wire, filament, rod, pipe, tube, powder, pellet, shot, wafer, plate, tablet, ingot, boat, crucible, ring, chunk, lump, granule, dendritic, crystal, etc.


SPUTTERING TARGET (metal, alloy, oxide and ceramics target):
1.) Metal sputtering target:
La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Sc, Y, Tellurium Te, Bismuth Bi, Tin Sn, Zinc Zn, Sulphur S, Lead Pb, Antimony Sb, Selenium Se, Chromium Cr, Cobalt Co, Aluminum Al, Nickel Ni, Titanium Ti, Tungsten W, Molybdenum Mo, Tantalum Ta, Niobium Nb, Zirconium Zr, Hafnium Hf, Vanadium V, Germanium Ge, Indium In, Ruthenium Ru, Palladium Pd, Platinum Pt, Rhenium Re, Gold Au, Silver Ag, Copper Cu, Iron Fe, Iridium Ir, Nickel Ni, Manganese Mn, Carbon C, Magnesium Mg

2.) Oxide and ceramics sputtering target:
La2O3, CeO2, Nd2O3, Sm2O3, Eu2O3, Gd2O3, Tb4O7, Dy2O3, Ho2O3, Er2O3, Tm2O3, Yb2O3, Lu2O3, Sc2O3, Y2O3, NiYb, Ni2Yb, Ni3Yb, Ta2O5, Ga2O3, V2O5, ZrO2, WO3, HfO2, CrB2, TiB2, TiC, SiC, WC, B4C, TaC, TiC, CaF2, MgO, Al2O3, V2O5, AlN, BN, Si3N4, CdS, ZnS, ZnSe, ZnO, ZnO:Al, Aluminum-Zinc Oxide, AZO, LSMO, CdTe, ZnTe, Bi2Te3, SnCl4, InSb, InAs, In2S3, In2Te3, Sb2O3, BaF2, Bi2O3, CaF2, CeF3, SrF3, Cr2O3, GaAs, HfO2, ITO, PbZrO3, LaF3, MgF2, MgO, MoO, Nb2O5, NdF3, NiO, SiO, SiO2, TiO, TiO2, Ti2O3, Ti3O5, SrBaTiO3, LiF, Ta5Si3, Mo5Si3, Cr-SiO, PZT, GZO, CuO/Al2O3, ZrO2, ZrN, LaN, CeN, PrN, NdN, SmN, EuN, GdN, TbN, DyN, HoN, ErN, TmN, YbN, LuN, ScN, YN, TiC

3.) Alloy sputtering target:
Co-Ni, V-Ni, Cr-Ni, Ti-Ni, Fe-Ni, Co-Ni-Cr, Co-Cr-Ta, Ho-Cu, Ce-Cu, Sm-Fe, Sm-Co, Gd-Fe, Tb-Fe, Dy-Fe, Dy-Co, Gd-Fe, Gd-Fe-Co, Dy-Fe-Co, Tb-Fe-Co, Nd-Fe-Co, Nb-Zr, Zr-Al, Al-Nd, Al-Ta, Al-V, Al-Mo, Al-Si, AlAg , AlSi, AlSiCu, CeGd, CeSm, CoZr, CoCr, CoNi, CoPt, CoNiCr, CoNiPt, Co-Fe, FeCoB, CoTaZr, CoNbZr, CoCrMo, CrV, CrB, CrSi, CrCu, GaAs, Ga-P, In-Sb, InAs, InP, InSn, MnFe, MnNi, NdDyFeCo, NiCr, NiFe, NiTi, NiV, TbGdFeCo, TiAl, TiSi2, TiW, V-Al, ZrTi, ZrNi, ZrNb, ZrAl, ZrCu, ZrY

For the applications to magnetic disk, TFT-LCD, magneto optical disk, protective film, glass, etc.


EVAPORATION MATERIALS
La2O3, CeO2, Pr6O11, Nd2O3, Sm2O3, Gd2O3, Dy2O3, Er2O3, Sm2O3, Yb2O3, Y2O3, LaF3, CeF3, PrF3, NdF3, SmF3, GdF3, DyF3, ErF3, YbF3, ScF3, YF3, HfO2, CaF2, ZnS, CdS, SiO2, HfO2, ZrO2, TiO2, TiO, Ti2O3, Ti3O5, Ta2O5, Nb2O5, SiO2, Al2O3, MgO, ZnO, WO3, Bi2O3, Sb2O3, Cr2O3, NiO, CuO, Fe2O3, V2O5, BaTiO3, SrTiO3, PrTiO3, LaTiO3, MgF2, BaF2, SrF3, CaF2, KF, NaF, ZnS, CdS, ZnSe.


SPECIFICATION OF MATERIALS (custom composition, drawing and size upon request):
1.) Foil, sheet, plate
Thickness: 0.05mm min.
Length: 1000mm max.
Width: 800mm max.

2.) Disc, wafer
Thickness: 0.05mm min.
Diameter: 600mm max.

3.) Powder
From -40, -60, -325, to -325 mesh

4.) Granule or pellet
Diameter:1mm-10mm

5.) Wire:
Diameter: 0.1mm min.
Length: according to customer's requirements.

6.) Rod
Diameter: 2.0mm-40mm
Length: 1500mm max.


SPECIAL RECOMMENDED PRODUCTS:
1.) Lanthanum hexaboride, LaB6
Used as a high brightness thermionic emission materials because of its low work function, high melting point and high metallic conductivity. LaB6 cathode for Leybold 1104 coating machines for precision optical coating is our advantage.

We also produce LaB6 powder, LaB6 disc, LaB6 rod, LaB6 crucible, LaB6 sector ring, LaB6 tube, YB6 rod, CeB6, PrB6, NdB6, SmB6, EuB6, GdB6, TbB6, DyB6, HoB6, ErB6, TmB6, YbB6, LuB6, ScB6, (LaBa)B6, (LaEu)B6, CaB6, etc.

2.) Cerium Mischmetal
Used as additives to ferrocerium rod for firestarter, sparking and lighter flint, Ferro Silicon Magnesium alloy.

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Cathay Advanced Materials Limited
B6208, Jinbao Chuangye Jiayuan,
Zhongkai High Technology Development Zone,
516006, Guangdong, China.
http://cachem.ebigchina.com
Tel: +86 75 2234 0449
Fax: +86 75 2262 7926
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About Us
Cathay Advanced Materials Limited is recognized for its unique capabilities in the fabrication of planar and rotatable sputtering target (Metal, Oxide, Alloy, Boride, Carbide, Nitride, Fluoride, Silicide, Sulfide), photovoltaic coating materials and Lanthanum Hexaboride (LaB6) to customers in industries, materials dealers, university and research institutes at competitive price.

1.) Oxide sputtering target:
CeO2, Nd2O3, Sm2O3, Eu2O3, Gd2O3, Tb4O7, Dy2O3, Ho2O3, Er2O3, Tm2O3, Yb2O3, Lu2O3, ...

New Products

Metal Sputtering Target
1.) Oxide sputtering target: CeO2, Nd2O3, Sm2O3, Eu2O3, Gd2O3, Tb4O7, Dy2O3, ...
Evaporation Materials
Transparent conductive oxide (TCO) coatings will dominate the development of ...
Ceramics Sputtering Target
1.) Oxide sputtering target: CeO2, Nd2O3, Sm2O3, Eu2O3, Gd2O3, Tb4O7, Dy2O3, ...
Oxide Sputtering Target
1.) Oxide sputtering target: CeO2, Nd2O3, Sm2O3, Eu2O3, Gd2O3, Tb4O7, Dy2O3, ...




Company Profile
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Company Name: Cathay Advanced Materials Limited
Country/Territory: China
Business Type: Manufacturer
Registration Date: 2002/07/19 (Year/Month/Date)
Buyer / Seller in EC21: Seller
Keyword sputtering target, evaporation materials, Photovoltaic coating, solar cell